And so repeating what I said before, we have a dense toroidal plasma in the center that spreads out to the wafer, and there's a number of advantages now of the ICP or HDP mode compared to the CCP mode, in that we can operate one at lower pressures, and we get the separation now of the plasma density and the energy, higher plasma density and a larger range of ion energy.重複我之前說過的話,我們在中心有一個緻密的環形等離子體,它向外擴散到晶片上,現在的 ICP 或 HDP 模式與 CCP 模式相比有很多優勢,因為我們可以在較低的壓力下運行,現在我們可以將等離子體密度和能量分離,等離子體密度更高,離子能量範圍更大。