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Welcome to the Creator's Comments!
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Thanks for taking interest in reading the comments.
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They aren't really timed to the audio, but will be spaced 4sec apart.
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To start, this video takes the #1 position for the most script revisions.
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By the end, I was at revision 40 of the script, just because it was such
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a complex topic that needed, and needed a good amount of scaffolding.
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A lot of complex details were cut out, so it's a good thing you're here reading
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the creator comments because we'll get to every detail that got cut from 39 revisions of script writing.
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Also this was the first script where I included a sponsor, so I hope you didn't
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mind the sponsored segments much. I tried to make them educational and integrated into the content.
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So one confusing detail is that transistors usually operate under one set
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of ON/OFF conditions, in order to perform MOSFET logic. Whereas
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these memory cells have three operational states, 1) Writing to a cell
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2) Reading from a cell, and 3) Erasing a cell.
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So, 95% of THIS video is about reading from a cell.
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Versus the previous video on quantum tunneling is 95% about writing to a cell.
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Don't mix up the operational modes of writing vs reading from a cell.
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I'll get to erasing a cell in a future episode. But that video will be in a slightly different format.
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So: I might as well lay this out here: 1 bit per cell = Single Level Cell [SLC]
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2 Bits Per Cell = Multi Level Cell [MLC] 3 Bits Per Cell = Triple Level Cell [TLC]
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4 Bits Per Cell = Quad Level Cell [QLC]
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Quad level cells are more cutting edge, however there is a huge trade-off.
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With QLC you can fit more bits, but 1) it takes a little longer to read information.
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2) It takes a TON of time longer to write information to each cell
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3) The threshold voltages are a lot closer so there is a
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higher liklihood of the data becoming corrupt more quickly.
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So TLC charge trap flash is the most common type of memory cell.
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Moving on, his enterprise SSD has 18 chips, and in each chip there are 8 or 16 die.
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One die is the layout of charge trap flash cells that we showed earlier and will show in a few seconds.
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FYI- there are 300 pints in this board to board connector... I counted...
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30 x 10... I didn't count every pin- that would be silly.
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Furthermore, in that SSD there are a set of DRAM and a pretty powerful controller.
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I say 100's of millions here, because there is a wide range storage capacities
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from smartphone to smartphone. This layout is for a single 1TB chip
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that is stacked 16 chips tall. But if you have a phone with a smaller capacity
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then the # of cells in each die is in the 100s of millions range.
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The calculations aren't that difficult overall, but the issue comes down
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to the variation in height, width, and depth of the die,
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how many die are in each microchip, and then how many microchips are
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in the particular SSD. But overall it should be closer to
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170-200ish billion memory cell range for a 64 GB single chip.
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Let's move on and briefly talk about this structure
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First, this structure isn't hollow but rather the empty areas are surrounded by insulating material.
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The indent of the charge trap helps to prevent charges from leaking from one celll
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to the cell above it. Furthermore the charge trap is composed of silicon nitride
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which is a dielectric itself, and is not conductive to having charges flow.
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The main difference between floating gate transistors and charge trap [CT] transistors
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IS in fact the fact that in [CT] transistors the charge trap is a dielectric material.
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The channel is a lightly n-doped polysilicon.
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The core filler is also a high K- dielectric.
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The core filler is actually critical because by using it, the channel becomes
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a hollow cylinder, or a 'macaroni' shape. This makes it such that the charge trap and gate
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have a stronger influence, and better control of the the channel
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Also 'macaroni' shape is the technical word I found in the textbooks.
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Okay, so for the next few minutes I'm gonna discuss a pretty significant
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"inaccuracy" I told throughout this entire episode.
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The inaccuracy is that the charge trap flash memory cell operates
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more like a depletion-mode N-Channel MOSFET.
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And what I'm describing here is an enhancement-mode N-Channel MOSFET.
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If you don't know the difference, then you don't have to worry, but I'll explain it anyways.
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In essence, in a charge trap transistor, and in depletion mode mosfets, the channel is
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ON when 0V is applied to the gate.
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In this graph I don't have numbers along the axis, but,
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if the 0V line were in the middle of the ON side, then this graph would be
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accurate, and when a negative volt is applied to the gate, the channel turns off.
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So why did I use this inaccuracy as the example? Well, the most common
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transistor is an Enhancement Mode N channel MOSFET, and the target audience
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for this video are high school students who may know what a transistor is, but
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for certain have no clue about enhancement mode vs depletion mode
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and have no clue about P vs N channels mosfets. So I stuck with the most
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common mosfet as the starting point, which is the N-Channel Enhancement
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MOSFET. And along that point, going into explaining ohmic regions vs. saturation
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regions would be even more confusing. If you want to learn more about that get an EE degree.
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BUT, if I were to talk about this charge trap transistor accurately, the lesson
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would go something like this:
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Normally, electrons CAN flow through the channel.
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When 0V are applied to the gate, and there are no charges on the
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charge trap, electrons can flow through the channel.
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But, when electrons are added onto the charge trap, these electrons
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inhibit the flow of electrons through the channel.
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However, when a positive voltage is applied to the gate, this voltage
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negates the negative charges on the charge trap,
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thus allowing the electrons to be able to flow through the channel again.
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And when even more electrons are added to the charge trap
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that means an even larger positive voltage on the gate is required
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to negate the negative charges on the charge trap.
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That's it. This would have been an equally useful and thorough
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explaination, however, it would confuse viewers who have learned about
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the basic mosfet, which is normally OFF when 0V is applied to the gate.
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And this lesson would have less of a lesson around threshold voltages.
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Okay, so lets get to specific voltages.
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In this setup, of a single level cell without any charges on the CT,
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the threshold voltage is somewhere around -0.5V.
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When electrons are placed on the CT, the threshold voltage shifts to around 3V.
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In order to write to a memory cell, in essence pulling charges
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from the channel into the CT, around 18-20V is required on the gate.
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Which is a LOT higher voltage than when just reading information.
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Furthermore, when you write to a cell, first you try to pull the charges
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through the tunnel oxide with 19ish V. And then you verify the stored number
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of electrons by applying the two separate threshold voltages.
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But when we get to TLC, or three bits of information, the writing voltage
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stays the same, but the threshold voltages are divided up from 0-4.5ish V.
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Similarly, after every step of writing to a memory cell, each memory cell's value
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for that attempted writing step is verified. It's easier to show with a graph
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which I'll do in a future episode.
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Another key detail is that the gates between all the memory cells in
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a page are connected to one another, and a page is 40,000ish memory cells.
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So when writing or reading to a cell, all 40,000 memory cells undergo the
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same operation. [Side note, when erasing, and entire block is erased]
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However this poses a problem- how is a single charge trap prevented from
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being written to, or specifically prevented from having electrons
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tunneled through the oxide from the channel and into the charge trap?
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Well, to prevent writing, the channel is biased to around 8V. And this
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makes the gate to channel potential only 12V, which isn't strong enough to
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tunnel the electrons. So as an example, when writing to a cell, the Gate is
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driven to 18V for a ~100 microseconds. If a memory cell doesn't want its charge
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trap to have electrons on it, the channel of that memory cell is biased to 8 V.
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Next, the gate voltage is dropped to 0V, and each channel is checked whether
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its on or off to verify that the electrons moved as expected onto the appropriate
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charge traps. Next, the voltage is set to 18.3V, and again, the cells that don't want
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to be changed have their channel biased to 8V. And then the voltage
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is dropped down to the corresponding expected threshold voltage.
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And this process repeats over and over, until each memory cell has the
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desired number of electrons set into the charge trap. This is a long process, and
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is even longer when dealing with QLC, or quad level cells.
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So onto the inverted assignment, and why no electrons is a 0, and some electrons
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are a 1. I asked a few scientists and engineers this, and they replied that it was
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with this generation of technology, it is mostly arbitrary. In fact, for TLC the
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assignment from lowest threshold voltage to highest threshold voltage
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goes 111, 011, 001, 101, 100, 000, 010, 110. With 111 = Erased and
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110 = the most electrons in the charge trap.
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The order of 111, 011, 001... follows a gray code where each subsequent
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value has only 1 bit changed, however there are a lot of different ways
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this grey code could be ordered, and with that different companies follow
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different binary schemes. The purpose of the grey code is to help improve
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reliability, and error checking.
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But overall it doesn't have to be a specific order. Or at least that's what
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I found in my research.
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One interesting detail about these enterprise SSDs, is that they
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have a DWPD spec, which stands for daily writes per day.
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The 'Enterprise Write Intensive SSD' can have capacities up to 3.2TB, and
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have 10 DWPD, with a warranty of 5 years.
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That means that for 5 straight years, this SSD can be writing and replacing
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its 3.2 TB of information, 10 times a day.
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That's about 58.4 Petabytes of data written and erased over 5 years!
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I know these SSDs are used for transactional data, but that's just
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a ton of write / erase cycles for a single SSD to perform.
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Another detail not entirely discussed in this episode is that the data
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written to and read from a single SSD is distributed relatively evenly throughout
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all the chips and die on that SSD. To explain that better. As mentioned before,
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In that KIOXIA enterprise SSD there were 18 chips, and in each chip theres
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a stack of lets say 8 die [approx] , or 8 layouts like the massive layout we are showing.
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When you take a video, that video is broken up and evenly distributed across
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those 144 [8x18] die. You would think that the entire video should be
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stored on a single die, but in order to erase/ write and read significantly faster, the
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single file is chopped up into block size pieces and stored across all of the die.
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As mentioned before, in a single die, only one page can be written to or read
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at any given time. But when the data gets written to or read from 144 die,
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that means there are 144 pages written to or read from simultaneously.
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That being said, a small portion of each die is assigned to error correcting code
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so that if any of the die has a failure, then none
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of the data is lost. In fact these enterprise SSDs have a spec
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that say 2 of the entire chips can undergo failures, and all your data
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will still maintain its full integrity. That's actually why there are 18 chips
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instead of 16 [where 16 is a power of 2, and a lot of things in computers
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are found in powers of 2].
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Moving on- just to quickly repeat in case someone joined these creators
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comments a little bit late. The order of binary assignment to threshold voltages
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of 111, 110, 101, 100, 011, 010, 001, 000, where 111 is no electrons
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is inaccurate. It should be 111, 011, 001, 101, 100, 000, 010, 110 as an example.
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But this assignment would be hella confusing for most people, and it would
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open up a set of additional questions that I couldn't really dive into in this episode.
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Also, as for the specs listed above, there are a wide range of different
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specs for SSDs in terms of capacity, price, read and write speeds,
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reliability, daily writes per day, power consumption, form factor.
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In general, enterprise SSDs cost more, and have higher read write speeds, and
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better reliability. Also another question is, if SSDs have a 5 year warranty [typically]
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why would anyone ever get a 30TB SSD? Especially considering 30TB
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would usually be used for long term storage. The answer is that there are
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a good number of applications, specifically in research, simulation, or
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transactions, that require incredible amounts of storage space,
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but don't use that storage space in the form of static long term files.
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As for dimensions, the entire cell is somewhere in the range of
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160 - 200 nanometers wide. However I don't have exact numbers as these are
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very closely held secrets. On each side, the dielectric between the
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control gate and charge trap is around 15 nm. The charge trap of Silicon nitride
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is 50ish nanometers, the tunnel oxide is 8 nanometers, and then the channel
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is around 10ish nanometers. Maybe one day I'll work with a company
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who shares revealing more details, but until then I just gotta go from what
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I can find in text books.
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Anywho, thanks a ton for reading these creator's comments
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If you have any further question post them in the comments below!!
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Also, as mentioned in a previous episodes creator comments
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this technology is not designed and created by aliens, there is a long list of
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companies and progressive developments throughout the past 70 years.
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Also if aliens did give us this technology
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why didn't they also give us the technology to create
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giant Jaegers [giant robots].